跳到主要內容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 閱讀詳情

Moov logo

Moov Icon
APPLIED MATERIALS (AMAT) PI 9500
  • APPLIED MATERIALS (AMAT) PI 9500
  • APPLIED MATERIALS (AMAT) PI 9500
  • APPLIED MATERIALS (AMAT) PI 9500
描述
High Current Implanter
配置
無配置
OEM 代工型號說明
The AMAT PI 9500 is a high-energy ion implanter system designed for semiconductor manufacturing. It is compatible with 6-inch wafer sizes. This precision implanter utilizes a horizontal beam line, resulting in low particle contamination and reduced charging effects. The PI 9500 is specifically engineered to meet the demands of producing high-density semiconductor devices, including 16-megabit and 64-megabit memory devices, as well as advanced microprocessors. It offers a reliable and efficient solution for ion implantation processes critical to modern semiconductor fabrication.
文檔

無文檔

類別
High Current

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

119903


晶圓尺寸:

8"/200mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

APPLIED MATERIALS (AMAT)

PI 9500

verified-listing-icon
已驗證
類別
High Current
上次驗證: 超過60天前
listing-photo-d9ddf2dfd26548969e5c60256186d05f-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

119903


晶圓尺寸:

8"/200mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
High Current Implanter
配置
無配置
OEM 代工型號說明
The AMAT PI 9500 is a high-energy ion implanter system designed for semiconductor manufacturing. It is compatible with 6-inch wafer sizes. This precision implanter utilizes a horizontal beam line, resulting in low particle contamination and reduced charging effects. The PI 9500 is specifically engineered to meet the demands of producing high-density semiconductor devices, including 16-megabit and 64-megabit memory devices, as well as advanced microprocessors. It offers a reliable and efficient solution for ion implantation processes critical to modern semiconductor fabrication.
文檔

無文檔