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APPLIED MATERIALS (AMAT) PI 9500
    描述
    High Current Implanter
    配置
    無配置
    OEM 代工型號說明
    The AMAT PI 9500 is a high-energy ion implanter system designed for semiconductor manufacturing. It is compatible with 6-inch wafer sizes. This precision implanter utilizes a horizontal beam line, resulting in low particle contamination and reduced charging effects. The PI 9500 is specifically engineered to meet the demands of producing high-density semiconductor devices, including 16-megabit and 64-megabit memory devices, as well as advanced microprocessors. It offers a reliable and efficient solution for ion implantation processes critical to modern semiconductor fabrication.
    文檔

    無文檔

    類別
    High Current

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    119904


    晶圓尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    APPLIED MATERIALS (AMAT)

    PI 9500

    verified-listing-icon
    已驗證
    類別
    High Current
    上次驗證: 超過60天前
    listing-photo-491f88b884d84645946feadc08375670-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    119904


    晶圓尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    High Current Implanter
    配置
    無配置
    OEM 代工型號說明
    The AMAT PI 9500 is a high-energy ion implanter system designed for semiconductor manufacturing. It is compatible with 6-inch wafer sizes. This precision implanter utilizes a horizontal beam line, resulting in low particle contamination and reduced charging effects. The PI 9500 is specifically engineered to meet the demands of producing high-density semiconductor devices, including 16-megabit and 64-megabit memory devices, as well as advanced microprocessors. It offers a reliable and efficient solution for ion implantation processes critical to modern semiconductor fabrication.
    文檔

    無文檔