描述
無描述配置
The FEI FIB 200-P uses the pre-lens ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication, nanoprototyping and MEMS. • Pre-lens column 5-30kV, with excellent beam profile and stability • Milling Power: 11nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis, comp-eucentric tilt stage • Full coverage of 70mm diameter • Motorized XYXR: 50 x 50 x 25mm x n x 360° x Manual T -15° +60 • Front door load • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVPOEM 代工型號說明
The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.文檔
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THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 200
已驗證
類別
FIB
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
14242
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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FIB 200
已驗證
類別
FIB
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
14242
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
The FEI FIB 200-P uses the pre-lens ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication, nanoprototyping and MEMS. • Pre-lens column 5-30kV, with excellent beam profile and stability • Milling Power: 11nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis, comp-eucentric tilt stage • Full coverage of 70mm diameter • Motorized XYXR: 50 x 50 x 25mm x n x 360° x Manual T -15° +60 • Front door load • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVPOEM 代工型號說明
The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.文檔
無文檔