ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

ASML

TWINSCAN EXE:5000

Third-generation EUV systems
ASML’s TWINSCAN NXE:3400B supports EUV volume production at the 7 and 5 nm nodes. The 300 mm wafer throughput target specification for the NXE:3400B is larger than or equal to 125 wafers per hour under the following conditions: Dose: 20mJ/cm2, die size: 26 x 33 mm, 96 shots.

TWINSCAN NXE:3400B

TWINSCAN EXE:5200 system – an extreme ultraviolet (EUV) high-volume production system with a high numerical aperture and more than 200 wafers per hour productivity.

EUV

概述

服務

EUV 的製造商

EUV 最熱門的產品

TWINSCAN EXE:5000

TWINSCAN NXE:3400B

TWINSCAN EXE:5200

TWINSCAN NXE:3800E