GAMMA 2100
類別
ICP概述
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.
活躍中的上架商品
2
服務
檢驗、保險、評估、物流