概述

The Primo AD-RIE® system is AMEC’s second-generation dielectric etch product. Built upon the proven D-RIE architecture, the system embodies new proprietary designs featuring advanced capabilities such as a switchable dual-low-frequency RF generator, multi-zone gas distribution, and dual-chiller temperature control system. To maximize productivity, the AD-RIE system employs a cluster tool design that can be configured with up to three dual-station process modules (or six processing stations) per system. The AD-RIE product delivers the most advanced capabilities for new generation IC device manufacturing requirements, world wildly used for 40-7nm BEOL applications, and 10nm FEOL applications development and production.