描述
無描述配置
Configuration: - Model: MPX ICP PRO - Process Chamber: ASE-HRM - ASE-HRM chamber: High Rate Magnetic source achieves over three times the etch rates versus the original Bosch process - Process: High Rate Deep Silicon Etch - Operating software: Windows - Max wafer size capable: 200mm - Voltage: 208V 60Hz 3Ph Vacuum Load-lock For Single Chamber MPX systems (MESC): - Carousel Load Lock (200mm) - Chamber lid temperature control - Fully automatic transfer of substrates between the load-lock and the process chamber MPX ICP Process Chamber: - Production proven single wafer process chamber - Balun Coil for High Rate Etch - Turbo Pump - VAT Pendulum Valve - Backside Helium Cooling - Remote sealed extracted gas box with orbitally welded gas lines - Electronics cabinet - LCD flat panel monitor - Fully automatic multistep processing or manual operation - High Frequency RF Generator - Low Frequency RF Generator - Vacuum Pump (Load Lock) - Vacuum Pump (Chamber) - Chiller - System Cables (full set)OEM 代工型號說明
未提供文檔
無文檔
KLA / SPTS
MPX ICP PRO
已驗證
類別
Etch/Asher
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
24522
晶圓尺寸:
8"/200mm
年份:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部無類似上架商品
KLA / SPTS
MPX ICP PRO
類別
Etch/Asher
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
24522
晶圓尺寸:
8"/200mm
年份:
2003
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Configuration: - Model: MPX ICP PRO - Process Chamber: ASE-HRM - ASE-HRM chamber: High Rate Magnetic source achieves over three times the etch rates versus the original Bosch process - Process: High Rate Deep Silicon Etch - Operating software: Windows - Max wafer size capable: 200mm - Voltage: 208V 60Hz 3Ph Vacuum Load-lock For Single Chamber MPX systems (MESC): - Carousel Load Lock (200mm) - Chamber lid temperature control - Fully automatic transfer of substrates between the load-lock and the process chamber MPX ICP Process Chamber: - Production proven single wafer process chamber - Balun Coil for High Rate Etch - Turbo Pump - VAT Pendulum Valve - Backside Helium Cooling - Remote sealed extracted gas box with orbitally welded gas lines - Electronics cabinet - LCD flat panel monitor - Fully automatic multistep processing or manual operation - High Frequency RF Generator - Low Frequency RF Generator - Vacuum Pump (Load Lock) - Vacuum Pump (Chamber) - Chiller - System Cables (full set)OEM 代工型號說明
未提供文檔
無文檔
類似上架商品
查看全部無類似上架商品