概述

Apex SLR: ICP-Etch -Ideal for small volume production and R&D. Small footprint design -Load lock method, manual load specification -Adopts 2MHz ICP source. Improved etching rate and uniformity with high-density plasma -ICP source section can be opened and closed 90 degrees for easy access to the lower electrode, and equipped with a slide mechanism for easy turbo pump replacement. -Independent control of plasma density and bias possible -Compatible with chlorine-based etching applications -Compatible with various end point detection methods