![LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100](https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45829/bad5f33c01854b0398f17b0b21ffd7bb/d8c94dc661274cb9a0492e61514bc470_3a08b028d9134410acfeb6642cdc5e9845005c_lw.jpeg)
描述
ASHER配置
ASHEROEM 代工型號說明
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.文檔
無文檔
LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2100
已驗證
類別
Etch/Asher
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
48869
晶圓尺寸:
8"/200mm
年份:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2100
類別
Etch/Asher
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
48869
晶圓尺寸:
8"/200mm
年份:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
ASHER配置
ASHEROEM 代工型號說明
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.文檔
無文檔