描述
manual load table. 2 chemical cabinets 4 canisters.配置
無配置OEM 代工型號說明
The ZETA™ 200 is a fully automated system that can transfer wafer batches from incoming SMIF pods to the process chamber in a full mini-environment, ensuring minimal added particles. The system features the unique, high-temperature ViPR™ process for high-performance and low-cost stripping of resist, silicide, and other films. Batch spray processing provides a more economical alternative to single wafer resist strip solutions. The ZETA™ 200 can be configured with up to 8 different chemical inputs to a single, closed chamber, providing the flexibility to blend chemicals or change mix ratios and temperatures within a recipe. This system is also available in 300mm as the ZETA™ 300.文檔
無文檔
TEL / FSI
ZETA 200
已驗證
類別
Etch/Asher
上次驗證: 8 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
25335
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
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TEL / FSI
ZETA 200
類別
Etch/Asher
上次驗證: 8 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
25335
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
manual load table. 2 chemical cabinets 4 canisters.配置
無配置OEM 代工型號說明
The ZETA™ 200 is a fully automated system that can transfer wafer batches from incoming SMIF pods to the process chamber in a full mini-environment, ensuring minimal added particles. The system features the unique, high-temperature ViPR™ process for high-performance and low-cost stripping of resist, silicide, and other films. Batch spray processing provides a more economical alternative to single wafer resist strip solutions. The ZETA™ 200 can be configured with up to 8 different chemical inputs to a single, closed chamber, providing the flexibility to blend chemicals or change mix ratios and temperatures within a recipe. This system is also available in 300mm as the ZETA™ 300.文檔
無文檔
類似上架商品
查看全部無類似上架商品