1. PSS mass production dry etching equipment for 2", 4", 6" LED patterned sapphire substrates.
2. High-density plasma design improves etching rate and productivity.
3. Good etching uniformity.
4. Low operating cost. Simple operation and easy maintenance.

AST Juchang Technology has always been full of infinite ideals and enthusiasm for the optoelectronic semiconductor equipment industry.Thin film process: (1) E-Beam Evaporator (Electron Beam Evaporator), (2) Resistance Heating Evaporator (Resistance Heating Evaporator). Etching process: (1) TCP-RIE (High Density Plasma Reactive Ion Etching Equipment), (2) RIE (Reactive Ion Etching Equipment).

MP-370

類別

概述

活躍中的上架商品

服務

最熱門的上架商品

利用 Moov 將其上架並立即找到完美的買家。