描述
無描述配置
PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEM 代工型號說明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP文檔
無文檔
APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
已驗證
類別
Epitaxial deposition (EPI)
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
27602
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
已驗證
類別
Epitaxial deposition (EPI)
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
27602
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEM 代工型號說明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP文檔
無文檔