描述
無描述配置
Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.OEM 代工型號說明
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DESPATCH
LCB
已驗證
類別
Oven
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
15266
晶圓尺寸:
未知
年份:
未知
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Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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DESPATCH
LCB
已驗證
類別
Oven
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
15266
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.OEM 代工型號說明
未提供文檔
無文檔
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