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描述
Semiconductor Wafer Electroplating System Electroplating cup reactors for uniform films. Simple manual load system. Two chambers. Internal lines leached and exterior wiped clean. 208V, 3 Ph, 50/60 Hz, 40A配置
Model EQ212PMPLTNG150 EQUINOX The tool is not functional. Known issues: Robot connections issues, plating cell power supply drifting current away and not keeping up with recipe target current, CP2 head not working. Ran at 200mm. We had the 150mm conversion kit. Single wafer process head design. Fountain plater with 2 separate plating bath tanks and 2 SRD heads, total of 4 heads. Cassette to Cassette - input cassette on the left nest and output cassette on the right nest. 2 x SRD chambers + 2 x Plating chambers. Working area - 6’ x 4’ (W x L) Power supply - Dynatronix Model PMC 102/1PR-20-30XR, part # 990-0296-212OEM 代工型號說明
Equinox is a single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing, and electroplating. It offers configurations from one to six chambers with a centralized controller and robotics. The platform is capable of performing various processes on substrates ranging from 3" to 200mm in size. It works by using a central dual end-effector robot to transfer substrates from cassette to chamber and back again. Equinox can help automate manual steps and transfers while increasing throughput with a small footprint. It offers ultra-clean dry-to-dry operation with uniform plating and etching results. The platform can integrate sequential process steps with a low cost of ownership (CoO) and provides a migration path from small R&D platforms to production systems with the same process chambers and control features.文檔
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SEMITOOL
EQUINOX
類別
Electro Plating
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
75903
晶圓尺寸:
未知
年份:
2010
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描述
Semiconductor Wafer Electroplating System Electroplating cup reactors for uniform films. Simple manual load system. Two chambers. Internal lines leached and exterior wiped clean. 208V, 3 Ph, 50/60 Hz, 40A配置
Model EQ212PMPLTNG150 EQUINOX The tool is not functional. Known issues: Robot connections issues, plating cell power supply drifting current away and not keeping up with recipe target current, CP2 head not working. Ran at 200mm. We had the 150mm conversion kit. Single wafer process head design. Fountain plater with 2 separate plating bath tanks and 2 SRD heads, total of 4 heads. Cassette to Cassette - input cassette on the left nest and output cassette on the right nest. 2 x SRD chambers + 2 x Plating chambers. Working area - 6’ x 4’ (W x L) Power supply - Dynatronix Model PMC 102/1PR-20-30XR, part # 990-0296-212OEM 代工型號說明
Equinox is a single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing, and electroplating. It offers configurations from one to six chambers with a centralized controller and robotics. The platform is capable of performing various processes on substrates ranging from 3" to 200mm in size. It works by using a central dual end-effector robot to transfer substrates from cassette to chamber and back again. Equinox can help automate manual steps and transfers while increasing throughput with a small footprint. It offers ultra-clean dry-to-dry operation with uniform plating and etching results. The platform can integrate sequential process steps with a low cost of ownership (CoO) and provides a migration path from small R&D platforms to production systems with the same process chambers and control features.文檔
無文檔