概述

The Raider Mini Quattro ECD is a high-performance single-wafer Electrochemical Deposition (ECD) system with precision, fully automated wafer handling, and multiple process chambers. It has a small footprint, can handle up to 300mm substrates, and has on-board chemistry handling. The system is part of a platform that allows for seamless transfer from R&D to full production. It is a versatile and efficient system for electrochemical deposition processes.