The LT210c is an advanced electrochemical deposition tool that delivers high throughput in a small footprint. It uses patented Capsule™ technology for superior copper fill and integrated removal of backside and bevel copper contamination. The tool is fully automated and can fill features as small as 0.08µm with superior purity and uniformity. It has a small footprint and offers fast installation, low cost of ownership, and high reliability. The LT210c can be used for a variety of applications including Copper Damascene, Nickel ECD, Solder ECD, Gold ECD, Platinum ECD, Copper Anneal, Tantalum Anodization (High-K), Patterned Copper, Gold ElectroEtch, ECD Seed Layer, and Thin Film Heads.

Designed, developed & manufactured high performance and precision chemical processing equipment. Products included electrochemical deposition systems for electroplating copper, gold, solder and other metals; surface preparation systems for cleaning, stripping and etching silicon wafers; and wafer transport container cleaning systems.

LT-210c

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