概述

The 2300 Motif is a post-lithography pattern enhancement system by Lam Research. It uses plasma etch technologies to reduce the original printed critical dimension of a feature by as much as 50 nm for holes and 100 nm for trenches, delivering well-controlled final CDs as small as 10 nm. The film deposited by the Motif system enhances plasma etch resistance, reducing line roughening and distortion during pattern shrinking and transfer. The Motif technology can also be used for double patterning with CD shrink to enable both feature size and pitch scaling, as well as for removable spacers that simplify otherwise costly and complicated processes.