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LAM RESEARCH CORPORATION 2300 VERSYS KIYO
    描述
    Metal Etch
    配置
    2300 KIYO EX
    OEM 代工型號說明
    The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.
    文檔

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    類別
    Dry / Plasma Etch

    上次驗證: 13 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    62675


    晶圓尺寸:

    12"/300mm


    年份:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 13 天前
    listing-photo-65d582a1169d4f49a4ae43cfa7e60900-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    62675


    晶圓尺寸:

    12"/300mm


    年份:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Metal Etch
    配置
    2300 KIYO EX
    OEM 代工型號說明
    The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.
    文檔

    無文檔