The NanoQuest I ion beam etching system is the ideal platform for etching single wafer substrates up to 4”.
With a high cooling substrate stage, the system can etch through photo resist or masks to produce patterned substrates on any material.

Technical Features:
• Housed in compact one-piece frame with integral electronics rack to minimize lab space.
• High vacuum design principles for quick cycle times and low ultimate pressure performance.
• UHP Gas distribution ensures stable ion source operation.
• Stainless steel frame with integral instrument rack, housing a touch screen LabView interface to PLC controller.
• Completely automated;
o pump down,
o gas flow control,
o ion source operation for repeatable and reliable etching of substrates.

Condition: Not in full working condition - (Qty. 3) Backing pumps (ACP15) & SIMs probe and controller not included

INTLVAC

The INTLVAC Nanoquest I is a versatile ion beam etching (IBE) system designed for precision substrate fabrication. It is capable of etching single wafer substrates up to 4 inches in diameter, with the option to expand to 5 inches for specialized configurations. The system features a high cooling flow substrate stage, allowing for etching through photoresist or masks to create patterned substrates on various materials. Its compact design includes an integral electronics rack, minimizing lab or cleanroom space requirements. The Nanoquest I also offers full automation of pump down, gas flow control, and ion source operation, ensuring repeatable and reliable etching processes.

INTLVAC

Nanoquest I

Dry / Plasma Etch

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Nanoquest I

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