APPLIED MATERIALS (AMAT) CENTURA METAL DPS

描述

Description Dimension Qty MAIN FRAME 87 104 97 1 SYSTEM CONTROLLER 44 44 85 1 RF GENERATOR RACK 48 26 84 1 MONITOR RACK 26 23 56 1 NESLAB CHX-150 38 26 41 1 NESLAB HX-150 38 26 41 1 AMAT-1 HEAT EXCHANGER 2EA 48 41 33 1 BULK CONTR-1: CABLES, HOIST, MISC PARTS 41 49 36 1 BULK CONTR-2: CABLES, HOIST, MISC PARTS 41 49 36 1 MISSING 1. CHILLER DI FILTER TANK X 1EA (CHX-150) 2. CHILLER DI FILTER TANK X 1EA (HX-150) 3. CHILLER DI FILTER TANK X 2EA (AMAT-1) 4. SIGNAL TOWER

配置

MODEL : CENTURA PHASE-II METAL PROGRESS TYPE: METAL ETCH CHAMBER POSITION: CH #A - DPS R1 CHAMBER CH #B - DPS R1 CHAMBER CH #C - ASP+ CHAMBER CH #D - ASP+ CHAMBER CH #E - STD COOL DOWN CHAMBER CH #F - ORIENT CHAMBER ROBOT : HP ROBOT TURBO PUMP : ALCATEL ATH 1300M RF GENERATOR : ENI OEM12B/ AE MF5002 CONTROLLER: 84 INCH COMMON CONTROLLER DRY PUMP : N/A CHILLER : NESLAB CHX-150/ HX-150/ AMAT1 X2EA

OEM 代工型號說明

Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).