概述

The Dielectric Etch eMax Centura system is a new-generation dielectric etch system that offers customers unprecedented technical capability, cost-efficiency and productivity for meeting the challenges of their sub-0.13 micron designs. The eMax system features medium-density plasma source technology, a completely new chamber design and innovative process chemistry to maximize etching performance and productivity while reducing system operating cost. The eMax Centura II can be configured with up to four process chambers, allowing a significant operational cost advantage over more limited capacity three-chamber systems.