概述

The AMAT Centura DPS is a highly efficient semiconductor processing system with a unique architecture that groups four processing stations and two auxiliary chambers around a central transfer module housing an ultra-reliable magnetically-coupled vacuum robot. It is designed for ≤200mm wafer fabrication and supports various applications such as Chemical Vapor Deposition (CVD), epitaxy, etch, plasma nitridation, and Rapid Thermal Processing (RTP).