概述

The Centura 5200 DPS R1 is a high-performance metal etch system introduced by Applied Materials1. It delivers high-productivity silicon, metal, and dielectric etch2. The system has two enhanced chambers: the DPS etch chamber and the ASP+ (advanced strip and passivation) module. The Centura 5200 DPS R1 system is designed for 150mm and 200mm or 8" wafer sizes.