概述

The TEL (Tokyo Electron) Trias SPA is a single-wafer plasma processing system designed for semiconductor manufacturing. It utilizes Tokyo Electron's Slot Plane Antenna (SPA) technology to generate high-density, low-electron-temperature plasma, enabling low-damage, low-temperature plasma treatments. This system is particularly suited for critical front-end-of-line (FEOL) applications, including gate nitridation, gate recovery oxidation, and shallow trench isolation (STI) liner oxidation.