概述

The NSX-100 is a high-throughput and repeatable macro defect inspection solution that is part of the NSX® Series. It is designed to detect macro defects (defects 0.5 micron and larger) that can occur during various stages of device manufacturing, such as wafer manufacturing, probing, bumping, dicing, or general handling. These defects can have a significant impact on the quality of microelectronic devices. The NSX-100 provides fast and consistent 2D bump inspection and valuable process information for enhanced process control and product consistency. This information can be transferred to Discover™, Rudolph’s yield management software, for further analysis and review. The NSX-100 is suitable for 200 mm applications and has time-tested applications in various markets, including semiconductor, optoelectronics, wafer bumping, data storage, micro electromechanical systems (MEMS), and micro display markets. It offers automated, 100% advanced macro defect inspection to ensure quality assurance. NSX-100 series systems are able to inspect as many as 97 wafers-per-hour.