The new E25 System provides edge inspection for CMP, etch, clean, deposition, pre-RTP and final QA processes, and is designed to cope with the challenges of edge inspection, including curved surfaces, ever-changing bevel profiles, process variations and nuisance defects.

Onto Innovation is a worldwide leader in the design, development, manufacture and support of process control tools that perform macro defect inspections and metrology, lithography systems, and process control analytical software used by semiconductor wafer and advanced packaging device manufacturers. 

E25

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