概述

The LMS IPRO3 is a high-performance pattern placement and CD metrology system designed for use with masks and wafers of up to 300mm in size. Its flexible feature edge detection, which uses image analysis, allows engineers to solve a variety of day-to-day problems, such as process control on non-orthogonal features. Additionally, the system’s flexible and comprehensive data analysis software provides valuable information on pattern generator, process quality, and product quality. This makes the LMS IPRO3 an essential tool for ensuring the highest levels of precision and accuracy in the manufacturing process.