The Puma 9500 Series narrowband inspection systems provide high performance excursion monitoring for the 32nm and below design nodes. It has twice the resolution and speed of previous-generation Puma laser imaging inspectors. It is part of a portfolio of advanced wafer defect inspection tools that accelerate the development and production ramp of leading-edge devices. It provides the sensitivity-at-throughput required to control critical yield excursions for a broad range of applications, including CMP, Etch, Lithography, and Films.

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

PUMA 9500

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