概述

The 2371 is a next-generation, ultra-broadband brightfield patterned wafer inspector designed for sub-65-nm design rule development and ramp. It provides increased defect detection, resolution, and sensitivity through flexible broadband deep ultraviolet (DUV) illumination and optical modes. It also offers superior resolution, sensitivity, material contrast, noise suppression, real-time defect classification, and SEMI compliance. The 23xx series, eS31, and AIT series combine to form a comprehensive defect inspection solution for all stages of semiconductor manufacturing.