概述

The 2367 UV/visible brightfield inspector is sensitive to a broad range of defects for 65nm and above design nodes. It has improved throughput, high defect sampling, and is field-upgradeable from any 23xx systems. It has a 2x data rate increase, low false count rate, and automatic defect classification algorithms. It can be used with 28xx inspection systems and other KLA-Tencor tools. It also has a Process Window Qualification application for detecting systematic defects.