概述

The 2350 is a system that uses UV/visible illumination and noise suppression technology to detect defects at 0.13 µm and 0.10 µm design rules. It has Full Sky and Edge Contrast modes for increased sensitivity on FEOL layers and better noise suppression on BEOL layers. It can inspect 200mm or 300mm patterned wafers with higher throughput than its predecessors and has iADC and PMC-Net TM for fast and consistent defect classification and identification.