The KLA-201 Automatic Photomask Inspection Station allows you to inspect photomasks and multi­die reticles for random defects today and to quickly add repeating defect inspection and single-die reticle inspection capability tomorrow. In addition, glass wa­fers can be inspected for both random and repeating defects. 

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

201

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