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KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
描述
無描述
配置
Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
OEM 代工型號說明
The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
文檔

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類別
Defect Inspection

上次驗證: 超過60天前

關鍵商品詳情

條件:

Refurbished


作業狀態:

未知


產品編號:

101992


晶圓尺寸:

6"/150mm


年份:

2005


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

CANDELA OSA-6100

verified-listing-icon
已驗證
類別
Defect Inspection
上次驗證: 超過60天前
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/1c8a2b6d370b4e1e924015956d108fe7_2_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/be51dfbbef7d4b6fb5f28e4ea7efa111_1_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/485ae4d985684bc3a9bda518effa6a2f_4_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/7bf686ce73dc442696cbdb6f62d15783_spk3632_mw.jpg
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/5c44323dce4c44c79036257d84eefc90_3_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/10b7fd1f006847c59fad2da85a59a40e_spk3633_mw.jpg
關鍵商品詳情

條件:

Refurbished


作業狀態:

未知


產品編號:

101992


晶圓尺寸:

6"/150mm


年份:

2005


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
OEM 代工型號說明
The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
文檔

無文檔