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KLA CANDELA OSA-6100
    描述
    無描述
    配置
    Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
    OEM 代工型號說明
    The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
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    KLA

    CANDELA OSA-6100

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    已驗證

    類別

    Defect Inspection
    上次驗證: 超過30天前
    關鍵商品詳情

    條件:

    Refurbished


    作業狀態:

    未知


    產品編號:

    101992


    晶圓尺寸:

    6"/150mm


    年份:

    2005

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    Money Back Guarantee
    Available
    Transaction Insured by Moov
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    Refurbishment Services
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    KLA CANDELA OSA-6100
    KLACANDELA OSA-6100Defect Inspection
    年份: 0條件: 二手
    上次驗證超過60天前

    KLA

    CANDELA OSA-6100

    verified-listing-icon

    已驗證

    類別

    Defect Inspection
    上次驗證: 超過30天前
    listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/1c8a2b6d370b4e1e924015956d108fe7_2_mw.png
    listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/be51dfbbef7d4b6fb5f28e4ea7efa111_1_mw.png
    listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/485ae4d985684bc3a9bda518effa6a2f_4_mw.png
    listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/7bf686ce73dc442696cbdb6f62d15783_spk3632_mw.jpg
    listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/5c44323dce4c44c79036257d84eefc90_3_mw.png
    listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/10b7fd1f006847c59fad2da85a59a40e_spk3633_mw.jpg
    關鍵商品詳情

    條件:

    Refurbished


    作業狀態:

    未知


    產品編號:

    101992


    晶圓尺寸:

    6"/150mm


    年份:

    2005


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
    OEM 代工型號說明
    The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
    文檔

    無文檔

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