概述

The WF-736 DUO is an engineering analysis system that, along with the WF-731 production monitoring system, provides new solutions for yield enhancement in patterned wafer defect detection. The WF-736 DUO combines brightfield and darkfield imaging to achieve a sensitivity of 0.1µm on advanced design rule applications. The WF-731, on the other hand, delivers high wafer throughput (34 WPH at 0.3µm sensitivity) for immediate feedback on critical process steps. These wafer inspection tools are part of a family that offers the first defect detection systems with a common platform, enabling easily transportable engineering recipes and uniformity in training, service, and spare parts.