概述

The RT-8000ES is an advanced reticle inspection system that provides fully automated inspection of up to 10 reticles. It uses advanced die-to-database comparisons to detect defects on all advanced mask types for device design rules down to 0.18µm. The system’s Data Express™ module allows users to perform full-speed inspection of all masks and designs manufactured today, including reticles requiring resolution and process enhancement technologies like Optical Proximity Correction and Phase-Shift Masks, without compromising throughput or selectivity. Additionally, the RT-8000ES features a new “Line Width Error Detector” that provides additional capabilities to help detect misplaced and improperly sized features, edge defects, and line width variations. This makes the RT-8000ES a powerful tool for ensuring the quality and accuracy of reticles used in the semiconductor manufacturing process.