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APPLIED MATERIALS (AMAT) SEMVISION G4
    描述
    Defect Review SEM
    配置
    Defect Review SEM
    OEM 代工型號說明
    The fourth generation Applied SEMVision is the fastest and most advanced line of SEM defect review and analysis systems for 45nm manufacturing and beyond. Building on 10 years of technical innovation and leadership, SEMVision G4 products (G4, G4 HP, and G4 MAX) offers the most productive and cost-effective path to in-line defect resolution. G4 SEMVision G4 delivers high-throughput, in-line defect review and analysis with high resolution and state-of the-art algorithms for production and engineering applications. Imaging capabilities include enhanced MPS with five detectors for simultaneous imaging of material and topographic perspectives; voltage contrast and high aspect ratio (HAR) imaging; and a secondary electron spectrometer for bottom layer defects. Comprehensive defect analysis on the wafer's edge, bevel, and apex addresses critical defect migration issues associated with 32nm immersion lithography. EDXtreme [advanced automatic EDX (energy dispersive x-ray)] enables fast, full-spectrum acquisition material analysis of defects as small as sub-50nm particles. SEM column's rotatation and tilt flexibility up to 45° relative to the wafer makes available complete 3D data for superior defect visualization and classification. G4 HP SEMVision G4 HP sets the industry standard for productivity and cost of ownership with record sensitivity for unpatterned wafer review. Capable of automatically imaging 30nm defects at high throughput, the system supplements the G4's imaging capabilities with Automatic Process Inspection (API) and Quantified Process Monitoring (QPM) that combine high-resolution SEM imaging with tailored algorithms for automatic detection and monitoring of systematic defects. G4 MAX SEMVision G4 MAX is the sole defect review tool to offer automated in-line Wavelength Dispersive X-ray (WDX) material analysis for definitive identification of all existing elements. Combining the extreme energy resolution of WDX with the full-spectrum coverage and high throughput of EDXtreme, G4 MAX enables robust analysis of defects as small as 50nm at record cycle times.
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    APPLIED MATERIALS (AMAT)

    SEMVISION G4

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    已驗證

    類別

    Defect Inspection
    上次驗證: 2 天前
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    98033


    晶圓尺寸:

    未知


    年份:

    未知

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    類似上架商品
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    APPLIED MATERIALS (AMAT) SEMVISION G4
    APPLIED MATERIALS (AMAT)SEMVISION G4Defect Inspection
    年份: 2009條件: 二手
    上次驗證超過60天前

    APPLIED MATERIALS (AMAT)

    SEMVISION G4

    verified-listing-icon

    已驗證

    類別

    Defect Inspection
    上次驗證: 2 天前
    listing-photo-f612162cda5840e3b87ea61c6fd043e0-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    98033


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Defect Review SEM
    配置
    Defect Review SEM
    OEM 代工型號說明
    The fourth generation Applied SEMVision is the fastest and most advanced line of SEM defect review and analysis systems for 45nm manufacturing and beyond. Building on 10 years of technical innovation and leadership, SEMVision G4 products (G4, G4 HP, and G4 MAX) offers the most productive and cost-effective path to in-line defect resolution. G4 SEMVision G4 delivers high-throughput, in-line defect review and analysis with high resolution and state-of the-art algorithms for production and engineering applications. Imaging capabilities include enhanced MPS with five detectors for simultaneous imaging of material and topographic perspectives; voltage contrast and high aspect ratio (HAR) imaging; and a secondary electron spectrometer for bottom layer defects. Comprehensive defect analysis on the wafer's edge, bevel, and apex addresses critical defect migration issues associated with 32nm immersion lithography. EDXtreme [advanced automatic EDX (energy dispersive x-ray)] enables fast, full-spectrum acquisition material analysis of defects as small as sub-50nm particles. SEM column's rotatation and tilt flexibility up to 45° relative to the wafer makes available complete 3D data for superior defect visualization and classification. G4 HP SEMVision G4 HP sets the industry standard for productivity and cost of ownership with record sensitivity for unpatterned wafer review. Capable of automatically imaging 30nm defects at high throughput, the system supplements the G4's imaging capabilities with Automatic Process Inspection (API) and Quantified Process Monitoring (QPM) that combine high-resolution SEM imaging with tailored algorithms for automatic detection and monitoring of systematic defects. G4 MAX SEMVision G4 MAX is the sole defect review tool to offer automated in-line Wavelength Dispersive X-ray (WDX) material analysis for definitive identification of all existing elements. Combining the extreme energy resolution of WDX with the full-spectrum coverage and high throughput of EDXtreme, G4 MAX enables robust analysis of defects as small as 50nm at record cycle times.
    文檔

    無文檔

    類似上架商品
    查看全部
    APPLIED MATERIALS (AMAT) SEMVISION G4
    APPLIED MATERIALS (AMAT)
    SEMVISION G4
    Defect Inspection年份: 2009條件: 二手上次驗證: 超過60天前