描述
TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes missing parts: 2 resist pumps, 1Developer Line配置
無配置OEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
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TEL / TOKYO ELECTRON
MARK 7
已驗證
類別
Coaters & Developers
上次驗證: 昨日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
110894
晶圓尺寸:
8"/200mm
年份:
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部TEL / TOKYO ELECTRON
MARK 7
類別
Coaters & Developers
上次驗證: 昨日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
110894
晶圓尺寸:
8"/200mm
年份:
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes missing parts: 2 resist pumps, 1Developer Line配置
無配置OEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
無文檔