描述
Tokyo Electron ACT8 In Line Coater/Developer配置
2 coat, 3 develop, WEE, 8 Chill hot plates, 4 low temp hot plates, 4 chill plates, 2 adhesion units, 1 cup wash Right, 2C, 3D, 1WEE, 2AD, 4LHP, 8PCH, 4CPL, 1CWH, 1TCP, 3TRS Mainframe: Dual BlockIn line coat/developOEM 代工型號說明
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.文檔
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TEL / TOKYO ELECTRON
ACT 8
已驗證
類別
Coaters & Developers
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
93109
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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查看全部TEL / TOKYO ELECTRON
ACT 8
類別
Coaters & Developers
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
93109
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Tokyo Electron ACT8 In Line Coater/Developer配置
2 coat, 3 develop, WEE, 8 Chill hot plates, 4 low temp hot plates, 4 chill plates, 2 adhesion units, 1 cup wash Right, 2C, 3D, 1WEE, 2AD, 4LHP, 8PCH, 4CPL, 1CWH, 1TCP, 3TRS Mainframe: Dual BlockIn line coat/developOEM 代工型號說明
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.文檔
無文檔