SSP 200
概述
Application Coating/Developing/ Cleaning/Scrubbing Wafer size 4" ~ 12" Substrate Si, Ceramic, Glass Features • Stand-alone spin system • Optimized tool in R&D • Easy maintenance and operation • Faster delivery
活躍中的上架商品
0
服務
檢驗、保險、評估、物流
Messages
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