概述

The Spinner Unit LSM-200 is a device designed for use in the semiconductor industry. Its primary function is to apply photoresist on wafers. The device features a chuck that can accommodate substrates ranging in size from 1" to 6" (25 to 150 mm) and can spin at speeds ranging from 1 to 6000 rpm. Additionally, the LSM-200 comes equipped with a controller that can store up to 10 recipes, each with 24 steps. This allows for precise and repeatable application of photoresist on wafers.