描述
300MM 193NM IMMERSION W/MLR配置
無配置OEM 代工型號說明
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.文檔
無文檔
TEL / TOKYO ELECTRON
LITHIUS Pro Z
已驗證
類別
Coaters & Developers
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
67175
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部無類似上架商品
TEL / TOKYO ELECTRON
LITHIUS Pro Z
已驗證
類別
Coaters & Developers
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
67175
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
300MM 193NM IMMERSION W/MLR配置
無配置OEM 代工型號說明
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.文檔
無文檔
類似上架商品
查看全部無類似上架商品