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描述
SEM - Critical Dimension (CD) Measurement配置
無配置OEM 代工型號說明
The Applied VeritySEM4i, designed for sub-32nm metrology by Applied Materials, boasts a remarkable 1.5nm SEM resolution, optimal detection efficiency, and powerful image processing. The system highlights Fleet Matching with 0.3nm precision, and with its advanced SEM column design and algorithms, it tackles challenges like ArF resist shrinkage and SADP metrology. VeritySEM4i maximizes throughput, offers Å-level matching accuracy, and diminishes the need for multiple CD-SEM tools in fabs, resulting in boosted productivity and cost savings. Additionally, features like the Offline Recipe Generator streamline recipe creation, while OPC|CheckMax facilitates the automation of the OPC mask qualification process for sub-32nm chipmakers. Ultimately, VeritySEM4i encapsulates Applied Materials' vision to consistently innovate in the metrology and inspection industry.文檔
無文檔
類別
CD-SEM
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
71316
晶圓尺寸:
12"/300mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
VeritySEM 4i
類別
CD-SEM
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
71316
晶圓尺寸:
12"/300mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
SEM - Critical Dimension (CD) Measurement配置
無配置OEM 代工型號說明
The Applied VeritySEM4i, designed for sub-32nm metrology by Applied Materials, boasts a remarkable 1.5nm SEM resolution, optimal detection efficiency, and powerful image processing. The system highlights Fleet Matching with 0.3nm precision, and with its advanced SEM column design and algorithms, it tackles challenges like ArF resist shrinkage and SADP metrology. VeritySEM4i maximizes throughput, offers Å-level matching accuracy, and diminishes the need for multiple CD-SEM tools in fabs, resulting in boosted productivity and cost savings. Additionally, features like the Offline Recipe Generator streamline recipe creation, while OPC|CheckMax facilitates the automation of the OPC mask qualification process for sub-32nm chipmakers. Ultimately, VeritySEM4i encapsulates Applied Materials' vision to consistently innovate in the metrology and inspection industry.文檔
無文檔