概述

The Applied VeritySEM 3 Metrology system stands out with unparalleled precision, efficiently measuring 45nm gate features with a 3Å accuracy vital for 45nm device manufacturing. It boosts productivity and cost-effectiveness through advanced automation and precise tool matching, reducing reliance on operators and CD-SEM tools. The system's automated OPC Check feature, essential for integrating OPC designs beyond the 65nm tech node, employs proprietary algorithms for swift, manual-free measurements across numerous sites. Further, the enhanced OPC Check through Edge Contour Extraction offers improved modeling predictability by accurately integrating SEM contours with design intentions. With its state-of-the-art SEM technology, VeritySEM 3 ensures a sharp beam, superior ArF metrology resolution, and accelerated pattern recognition, elevating overall throughput.