SEM - Critical Dimension (CD) Measurement

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

The Applied VeritySEM4i, designed for sub-32nm metrology by Applied Materials, boasts a remarkable 1.5nm SEM resolution, optimal detection efficiency, and powerful image processing. The system highlights Fleet Matching with 0.3nm precision, and with its advanced SEM column design and algorithms, it tackles challenges like ArF resist shrinkage and SADP metrology. VeritySEM4i maximizes throughput, offers Å-level matching accuracy, and diminishes the need for multiple CD-SEM tools in fabs, resulting in boosted productivity and cost savings. Additionally, features like the Offline Recipe Generator streamline recipe creation, while OPC|CheckMax facilitates the automation of the OPC mask qualification process for sub-32nm chipmakers. Ultimately, VeritySEM4i encapsulates Applied Materials' vision to consistently innovate in the metrology and inspection industry.

APPLIED MATERIALS (AMAT)

VeritySEM 4i

CD-SEM

類似上架商品

APPLIED MATERIALS (AMAT)

VeritySEM 4i

APPLIED MATERIALS (AMAT)

VeritySEM 4i

VeritySEM 4i

CD-SEM

類似上架商品

APPLIED MATERIALS (AMAT)

VeritySEM 4i

APPLIED MATERIALS (AMAT)

VeritySEM 4i