描述
無描述配置
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:60 AMPS60 AMPS Recommended Packaging Form:CUSTOM PALLETCUSTOM PALLET Dimensions: StandardMetric Overall:51 x 81 x 80 IN - 3000 LBS1295.40 x 2057.40 x 2032.00 mm - 1360.80 kgOEM 代工型號說明
The Spray Acid Tool (SAT) is a versatile tool that offers a range of cleaning, etching, and stripping capabilities. It features a multichamber design that allows for safe and economical operation in a completely closed environment. The SAT is 300mm ready, meaning it can handle wafers of that size. Some of the specific applications of the SAT include post-CMP clean, photo-resist strip, polymer removal, pre-diffusion clean, monitor wafer clean, and metal etch. These processes are essential for the preparation and maintenance of semiconductor wafers during the manufacturing process.文檔
無文檔
SEMITOOL
SAT
已驗證
類別
Wet processing
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
39654
晶圓尺寸:
未知
年份:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEMITOOL
SAT
已驗證
類別
Wet processing
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
39654
晶圓尺寸:
未知
年份:
2004
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:60 AMPS60 AMPS Recommended Packaging Form:CUSTOM PALLETCUSTOM PALLET Dimensions: StandardMetric Overall:51 x 81 x 80 IN - 3000 LBS1295.40 x 2057.40 x 2032.00 mm - 1360.80 kgOEM 代工型號說明
The Spray Acid Tool (SAT) is a versatile tool that offers a range of cleaning, etching, and stripping capabilities. It features a multichamber design that allows for safe and economical operation in a completely closed environment. The SAT is 300mm ready, meaning it can handle wafers of that size. Some of the specific applications of the SAT include post-CMP clean, photo-resist strip, polymer removal, pre-diffusion clean, monitor wafer clean, and metal etch. These processes are essential for the preparation and maintenance of semiconductor wafers during the manufacturing process.文檔
無文檔