Plasma systems 400 and 660are low-pressure microwave plasma systems for cleaning advanced chip packages prior to die attach, wire bond and encapsulation. The electrode-free energy feeding is the key factor for processing substrates in their original, unslotted magazines. Microwaves of 2.45 GHz are simply applied through a window in the wall of the vacuum chamber producing a largely extended plasma there. Unslotted magazines are processed in a downstream configuration, slotted magazines are more properly placed on a rotating platform. Any size of magazine can be processed.

PVA TEPLA

300AL

MC 600

The IoN 100 is a barrel plasma reactor designed for R&D and production applications. The technology is based on the proven reactor designs developed over the course of 50+ years by International Plasma Corporation, Branson ICP, Dionex, Gasonics, Metroline, TePla and finally PVA TePla. IoN 100 uses a larger chassis that provides all the gas and power connections.

IoN 100

300 SemiAuto

IoN 10V

Plasma System is a barrel plasma reactor designed for R&D and production applications.

Ion 10Q

The IoN 100-40 Plasma System is our latest advancement in vacuum plasma technology. Gas plasma is fast becoming the technology of choice for surface modification of materials in the life sciences, electronic and industrial arenas due to its versatility and low impact to our environment.

PVA TEPLA

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400

660

300

300AL

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