The INTLVAC Nanoquest I is a versatile ion beam etching (IBE) system designed for precision substrate fabrication. It is capable of etching single wafer substrates up to 4 inches in diameter, with the option to expand to 5 inches for specialized configurations. The system features a high cooling flow substrate stage, allowing for etching through photoresist or masks to create patterned substrates on various materials. Its compact design includes an integral electronics rack, minimizing lab or cleanroom space requirements. The Nanoquest I also offers full automation of pump down, gas flow control, and ion source operation, ensuring repeatable and reliable etching processes.

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