概述

The Fiji series is a next-generation Atomic Layer Deposition (ALD) system that offers a wide range of deposition modes. Its modular design and flexible architecture allow for multiple configurations of precursors and plasma gases, making it capable of performing both thermal and plasma-enhanced deposition. The system has dimensions of 1600 x 715 x 1920 mm (F200) or 1845 x 715 x 1920 mm with a load lock (F200 with load lock). With its advanced capabilities, the Fiji 2000 is an excellent choice for high-vacuum ALD applications.