描述
Nikon NSR-S204B Wafer DUV Scanner配置
Laser Scanner Cymer: ELS-6400, Vintage:2001.08.09 KrF ScannerOEM 代工型號說明
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.文檔
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NIKON
NSR-S204B
已驗證
類別
248nm DUV
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled / Uncrated
產品編號:
93138
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NIKON
NSR-S204B
類別
248nm DUV
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled / Uncrated
產品編號:
93138
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Nikon NSR-S204B Wafer DUV Scanner配置
Laser Scanner Cymer: ELS-6400, Vintage:2001.08.09 KrF ScannerOEM 代工型號說明
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.文檔
無文檔