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NIKON NSR-S204B
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    OEM 代工型號說明
    The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.
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    NIKON

    NSR-S204B

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    類別

    248nm DUV
    上次驗證: 超過60天前
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    Used


    作業狀態:

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    產品編號:

    28082


    晶圓尺寸:

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    年份:

    未知

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    NIKON NSR-S204B
    NIKONNSR-S204B248nm DUV
    年份: 0條件: 二手
    上次驗證超過30天前

    NIKON

    NSR-S204B

    verified-listing-icon

    已驗證

    類別

    248nm DUV
    上次驗證: 超過60天前
    listing-photo-35c34bb8ce8d467b926c0f3df2b25647-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    28082


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.
    文檔

    無文檔

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